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LQM21PN2R2MC0D
+StücklisteFIXED IND 2.2UH 600MA 425MOHM SM
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HerstellerMurata Electronics
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Herstellerteil #LQM21PN2R2MC0D
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Datenblatt LQM21PN2R2MC0D DataSheet
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Auf Lager6764
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Spezifikationen
| Attribut | Wert |
| Series | LQM21 |
| Part Status | Active |
| Type | Multilayer |
| Material - Core | Ferrite |
| Inductance | 2.2 µH |
| Tolerance | ±20% |
| Current Rating (Amps) | 600 mA |
| Shielding | Shielded |
| DC Resistance (DCR) | 425mOhm Max |
| Frequency - Self Resonant | 50MHz |
| Operating Temperature | -55°C ~ 125°C |
| Inductance Frequency - Test | 1 MHz |
| Mounting Type | Surface Mount |
| Package / Case | 0805 (2012 Metric) |
| Supplier Device Package | 0805 (2012 Metric) |
| Size / Dimension | 0.079" L x 0.049" W (2.00mm x 1.25mm) |
| Height - Seated (Max) | 0.022" (0.55mm) |
| Base Product Number | LQM21PN |
Übersicht
Description
These inductors are designed to provide stable and reliable performance in various electronic circuits, ensuring minimal energy loss and maintaining signal integrity. They are commonly employed in power management systems, filtering applications, and in circuits that require signal conditioning. Key features include low DC resistance, high current capacity, and excellent electromagnetic interference (EMI) suppression, making them ideal for modern electronic designs.
Equivalent
Features
1. Inductance Value: 2.2 µH, suitable for various RF and power applications.
2. DC Resistance (DCR): Low DCR for minimized power loss and improved efficiency.
3. Rated Current: Capable of handling high currents, ensuring stability in power applications.
4. Package Size: Compact design, ideal for space-constrained environments.
5. Temperature Range: Operates effectively in a broad temperature range, enhancing reliability.
6. Ferrite Core Material: Offers high magnetic permeability, which aids in performance.
7. Shielded Design: Reduces electromagnetic interference (EMI), improving performance in sensitive applications.
This inductor is commonly used in power supply circuits, RF circuits, and filter applications.